Nanoscale etching of In0.53Ga0.47As for advanced CMOS processing

van Dorp, DennisDennisvan DorpArnauts, SophiaSophiaArnautsCuypers, DanielDanielCuypersRip, JensJensRipHolsteyns, FrankFrankHolsteynsDe Gendt, StefanStefanDe GendtKelly, JohnJohnKelly2021-10-222021-10-2220142162-8769https://imec-publications.be/handle/20.500.12860/24688Nanoscale etching of In0.53Ga0.47As for advanced CMOS processingJournal articlehttp://jss.ecsdl.org/content/3/6/P179.full