Integration of single damascene 85/85nm/L/S copper trenches in black diamond using 193nm optical lithography with dipole illumination

Van Olmen, JanJanVan OlmenWu, WenWenWuVan Hove, MarleenMarleenVan HoveTravaly, YoussefYoussefTravalyBrongersma, SywertSywertBrongersmaEyckens, BrendaBrendaEyckensMaenhoudt, MireilleMireilleMaenhoudtVan Aelst, JokeJokeVan AelstStruyf, HerbertHerbertStruyfDemuynck, StevenStevenDemuynckTokei, ZsoltZsoltTokeiVervoort, IwanIwanVervoortSijmus, BramBramSijmusVos, IngridIngridVosCiofi, IvanIvanCiofiStucchi, MicheleMicheleStucchiMaex, KarenKarenMaexIacopi, FrancescaFrancescaIacopi2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/8289Integration of single damascene 85/85nm/L/S copper trenches in black diamond using 193nm optical lithography with dipole illuminationProceedings paper