Development of main chain scission type photoresists for EUV lithography

Shirotori, AkihideAkihideShirotoriVesters, YannickYannickVestersHoshino, ManabuManabuHoshinoRathore, AshishAshishRathoreDe Simone, DaniloDaniloDe SimoneVandenberghe, GeertGeertVandenbergheMatsumoto, HirokazuHirokazuMatsumoto2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/34001Development of main chain scission type photoresists for EUV lithographyProceedings paperhttps://doi.org/10.1117/12.2536348