Sub-0.25 micron lithography applying illumination pupil filtering (quadrupole) on a DUV step-and-repeat system

Finders, JoJoFindersMulders, A. M.A. M.MuldersKrist, J.J.KristFlagello, D.D.FlagelloLuehrmann, P.P.LuehrmannMaenhoudt, MireilleMireilleMaenhoudtMarschner, ThomasThomasMarschnerDe Bisschop, PeterPeterDe BisschopRonse, KurtKurtRonse2021-09-302021-09-301998https://imec-publications.be/handle/20.500.12860/2573Sub-0.25 micron lithography applying illumination pupil filtering (quadrupole) on a DUV step-and-repeat systemProceedings paper