A high-performance drying method enabling clustered single wafer wet cleaning

Mertens, PaulPaulMertensDoumen, GeertGeertDoumenLauerhaas, JeffJeffLauerhaasKenis, KarineKarineKenisFyen, WimWimFyenMeuris, MarcMarcMeurisArnauts, SophiaSophiaArnautsDevriendt, KatiaKatiaDevriendtVos, RitaRitaVosHeyns, MarcMarcHeyns2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4580A high-performance drying method enabling clustered single wafer wet cleaningProceedings paper