MIS or MS? Source/drain contact scheme evaluation for 7nm Si CMOS technology and beyond

Yu, HaoHaoYuSchaekers, MarcMarcSchaekersDemuynck, StevenStevenDemuynckBarla, KathyKathyBarlaMocuta, AndaAndaMocutaHoriguchi, NaotoNaotoHoriguchiCollaert, NadineNadineCollaertThean, AaronAaronTheanDe Meyer, KristinKristinDe Meyer2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/27638MIS or MS? Source/drain contact scheme evaluation for 7nm Si CMOS technology and beyondProceedings paperhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7486665