Jonckheere, RikRikJonckheereWong, AlfredAlfredWongYen, AnthonyAnthonyYenRonse, KurtKurtRonseVan den hove, LucLucVan den hove2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/1288Optical proximity correction: mask pattern-generation challengesJournal article