Optimisation methodology towards a manufacturable 0.3 μm poly-gate process using i-line lithography

Finders, JoJoFindersBruggeman, B.B.BruggemanRonse, KurtKurtRonseVan den hove, LucLucVan den hoveTzviatkov, PlamenPlamenTzviatkovDusa, M.M.Dusa2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/1221Optimisation methodology towards a manufacturable 0.3 μm poly-gate process using i-line lithographyProceedings paper