Incubation, time-dependent drift and saturation during Al-Si-Cu electromigration: modelling and implications for design

Witvrouw, AnnAnnWitvrouwRoussel, PhilippePhilippeRousselBeyer, GeraldGeraldBeyerProost, JorisJorisProostMaex, KarenKarenMaex2021-10-012021-10-011998https://imec-publications.be/handle/20.500.12860/3159Incubation, time-dependent drift and saturation during Al-Si-Cu electromigration: modelling and implications for designProceedings paper