Two-dimensional profiling in silicon using conventional and electrochemical selective etching

Trenkler, ThomasThomasTrenklerVandervorst, WilfriedWilfriedVandervorstHellemans, L.L.Hellemans2021-10-012021-10-011998https://imec-publications.be/handle/20.500.12860/3001Two-dimensional profiling in silicon using conventional and electrochemical selective etchingJournal article