Impact of millisecond laser anneal on the thermal stress-induced defect creation in Si1-xGex source/drain junctions

Bargallo Gonzalez, MireiaMireiaBargallo GonzalezSimoen, EddyEddySimoenRosseel, ErikErikRosseelVerheyen, PeterPeterVerheyenHoffmann, Thomas Y.Thomas Y.HoffmannLoo, RogerRogerLooAbsil, PhilippePhilippeAbsilClaeys, CorCorClaeys2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13343Impact of millisecond laser anneal on the thermal stress-induced defect creation in Si1-xGex source/drain junctionsMeeting abstract