Effective post-etch residue removal on low-k films using single wafer processing

Kesters, ElsElsKestersGhekiere, JohnJohnGhekiereVan Doorne, PatrickPatrickVan DoorneVereecke, GuyGuyVereeckeMertens, PaulPaulMertensHeyns, MarcMarcHeyns2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7733Effective post-etch residue removal on low-k films using single wafer processingMeeting abstract