Optimized EUV mask absorber stack for improved imaging by reducing roughness and crystallinity of alternative absorber materials

Luong, VuVuLuongPhilipsen, VickyVickyPhilipsenHendrickx, EricEricHendrickxScholze, FrankFrankScholzevan de Kruijs, RobbertRobbertvan de KruijsEdrisi, ArashArashEdrisiWood, ObertObertWoodHeyns, MarcMarcHeyns2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/26933Optimized EUV mask absorber stack for improved imaging by reducing roughness and crystallinity of alternative absorber materialsProceedings paper