Hepp, BirgittBirgittHeppFinders, JoJoFindersDusa, MirceaMirceaDusaVleeming, BertBertVleemingMegens, henryhenryMegensMaenhoudt, MireilleMireilleMaenhoudtCheng, ShauneeShauneeChengVandeweyer, TomTomVandeweyer2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13865Critical assessment of error budget components in double patterning immersion lithographyProceedings paper