Shamiryan, DenisDenisShamiryanDanila, AndreyAndreyDanilaBaklanov, MikhaïlMikhaïlBaklanovBoullart, WernerWernerBoullart2021-10-182021-10-1820100734-2101https://imec-publications.be/handle/20.500.12860/17972TaN metal gate etch mechanisms in BCl3-based plasmasJournal article