Defects generation in SiO2/HfO2 studied with variable Tcharge-Tdischarge charge pumping (VT2CP)

Zahid, MohammedMohammedZahidDegraeve, RobinRobinDegraevePantisano, LuigiLuigiPantisanoZhang, JohnJohnZhangGroeseneken, GuidoGuidoGroeseneken2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/13255Defects generation in SiO2/HfO2 studied with variable Tcharge-Tdischarge charge pumping (VT2CP)Proceedings paperhttp://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=4227609