Xu, KaidongKaidongXuSouriau, LaurentLaurentSouriauHellin, DavidDavidHellinVersluijs, JankoJankoVersluijsWong, PatrickPatrickWongVangoidsenhoven, DizianaDizianaVangoidsenhovenVandenbroeck, NadiaNadiaVandenbroeckDekkers, HaroldHaroldDekkersShi, XiaopingXiaopingShiAlbert, JohanJohanAlbertTan, Chi LimChi LimTanVertommen, JohanJohanVertommenCoenegrachts, BartBartCoenegrachtsOrain, I.I.OrainKimura, Y.Y.KimuraWiaux, VincentVincentWiauxBoullart, WernerWernerBoullart2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/2340915nm HP patterning with EUV and SADP: key contributors for improvement of LWR, LER, and CDUProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1674531