Xu, DongboDongboXuGillijns, WernerWernerGillijnsKim, Ryan Ryoung hanRyan Ryoung hanKim2022-09-292022-09-162022-09-202022-09-292022-05-26978-1-5106-4979-80277-786XWOS:000844431900008https://imec-publications.be/handle/20.500.12860/40430Design and Mask Optimization Toward Low Dose EUV ExposureProceedings paper10.1117/12.2614268978-1-5106-4980-4WOS:000844431900008