Optimization of etching and stripping chemistries for Z3MS TM low-k

Lepage, MurielMurielLepageShamiryan, DenisDenisShamiryanBaklanov, MikhaïlMikhaïlBaklanovStruyf, HerbertHerbertStruyfMannaert, GeertGeertMannaertVanhaelemeersch, SergeSergeVanhaelemeerschWeidner, KenKenWeidnerMeynen, HermanHermanMeynen2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5442Optimization of etching and stripping chemistries for Z3MS TM low-kProceedings paper