Ab Initio Insights into the Reactivity of Precursors in Atomic Layer Deposition: A Case Study of GeAsSe

van der Linden, BramBramvan der LindenPourtois, GeoffreyGeoffreyPourtoisNyns, LauraLauraNynsClima, SergiuSergiuClimaPeissker, TobiasTobiasPeisskerDelabie, AnneliesAnneliesDelabie2026-03-122026-03-1220251932-7447https://imec-publications.be/handle/20.500.12860/58824engAb Initio Insights into the Reactivity of Precursors in Atomic Layer Deposition: A Case Study of GeAsSeJournal article10.1021/acs.jpcc.5c05127WOS:001595991700001FILMS((CH3)(3)SI)(2)TETELLURIUMGETE