Novel metrology for mask degradation: IR-AFM, XPS depth profiling and HAXPES

de Rooij-Lohmann, VeroniqueVeroniquede Rooij-LohmannMukherjee, ShriparnaShriparnaMukherjeeWu, Chien-ChingChien-ChingWuEbeling, RobRobEbelingPandey, KomalKomalPandeyvan Es, MaartenMaartenvan EsJonckheere, RikRikJonckheere2025-08-292025-08-292024978-1-5106-8157-60277-786XWOS:001536747100064https://imec-publications.be/handle/20.500.12860/46126Novel metrology for mask degradation: IR-AFM, XPS depth profiling and HAXPESProceedings paper10.1117/12.3032757978-1-5106-8158-3WOS:001536747100064