Huanca, Danilo R.Danilo R.HuancaChristiano, V.V.ChristianoAdelmann, ChristophChristophAdelmannVerdonck, PatrickPatrickVerdonckDos Santos Filho, Sebastio G.Sebastio G.Dos Santos Filho2021-10-222021-10-222015-091807-1953https://imec-publications.be/handle/20.500.12860/25401Physical characterization of hafnium aluminates dielectrics deposited by atomic layer depositionJournal articlehttp://www.sbmicro.org.br/jics/