Lin, Chia-HuiChia-HuiLinChen, Chun-HoChun-HoChenJenq, Jhy-SayangJhy-SayangJenqOp de Beeck, MaaikeMaaikeOp de BeeckVan den hove, LucLucVan den hove2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/1330DUV resist profile improvement on TiN deposited metal layerProceedings paper