The effect of etch-clean delay time on post-etch residue removal for front-end-of-line applications

Vos, IngridIngridVosHellin, DavidDavidHellinVereecke, GuyGuyVereeckePavel, ElisabethElisabethPavelBoullart, WernerWernerBoullartVertommen, JohanJohanVertommen2021-10-182021-10-1820091071-1023https://imec-publications.be/handle/20.500.12860/16505The effect of etch-clean delay time on post-etch residue removal for front-end-of-line applicationsJournal article