Winroth, GustafGustafWinrothGronheid, RoelRoelGronheidLin, ChuaChuaLinNeishi, KatsumiKatsumiNeishiHarukawa, RyotaRyotaHarukawaMarcuccilli, GinoGinoMarcuccilli2021-10-192021-10-1920110914-9244https://imec-publications.be/handle/20.500.12860/20153Quantitative pattern collapse metrology for 193nm immersion lithographyJournal article