Sidewall crystalline orientation effect on post-treatments for a replacement metal gate bulk fin field effect transistor

Lee, Jae WooJae WooLeeSimoen, EddyEddySimoenVeloso, AnabelaAnabelaVelosoCho, Moon JuMoon JuChoBoccardi, GuillaumeGuillaumeBoccardiRagnarsson, Lars-AkeLars-AkeRagnarssonChiarella, ThomasThomasChiarellaHoriguchi, NaotoNaotoHoriguchiGroeseneken, GuidoGuidoGroesenekenThean, AaronAaronThean2021-10-212021-10-2120131944-8244https://imec-publications.be/handle/20.500.12860/22661Sidewall crystalline orientation effect on post-treatments for a replacement metal gate bulk fin field effect transistorJournal articlehttp://pubs.acs.org/doi/abs/10.1021/am403270m