Nanoscale etching: dissolution of III-As and Ge in HCl/H2O2 solutions

van Dorp, DennisDennisvan DorpWeinberger, DavidDavidWeinbergerVan wonterghem, S.S.Van wonterghemArnauts, SophiaSophiaArnautsStrubbe, KatrienKatrienStrubbeHolsteyns, FrankFrankHolsteynsDe Gendt, StefanStefanDe Gendt2021-10-232021-10-232015-10https://imec-publications.be/handle/20.500.12860/26054Nanoscale etching: dissolution of III-As and Ge in HCl/H2O2 solutionsProceedings paperhttp://ecst.ecsdl.org/content/69/8/235.full.pdf+html