Overview of Ruthenium Thin Films Annealed by Microsecond Scanning UV Pulsed Laser: Structural, Electrical, and Failure Modes Analysis

Daubriac, RichardRichardDaubriacCancellara, LeonardoLeonardoCancellaraChehadi, ZeinabZeinabChehadiLu, LuLuLuThuries, LouisLouisThuriesKhaled, Mohamed AliMohamed AliKhaledRoze, FabienFabienRozeJourdan, NicolasNicolasJourdanTokei, ZsoltZsoltTokeiDescamps-Mandine, ArmelArmelDescamps-MandineHungria, TeresaTeresaHungriaFazzini, Pier-FrancescoPier-FrancescoFazziniTabata, ToshiyukiToshiyukiTabataHuet, KarimKarimHuet2025-01-142025-01-142025-JAN 71438-1656WOS:001391609100001https://imec-publications.be/handle/20.500.12860/45079Overview of Ruthenium Thin Films Annealed by Microsecond Scanning UV Pulsed Laser: Structural, Electrical, and Failure Modes AnalysisJournal article10.1002/adem.202402656WOS:001391609100001THERMAL-EXPANSION COEFFICIENTATOMIC LAYER DEPOSITIONYOUNGS MODULUSLATTICE-DYNAMICSGRAIN-GROWTHSILICONSTRESSMETALDELAMINATIONTEMPERATURE