Growth and physical properties of MOCVD-deposited hafnium oxide films and their properties on silicon

Van Elshocht, SvenSvenVan ElshochtCaymax, MattyMattyCaymaxDe Gendt, StefanStefanDe GendtConard, ThierryThierryConardPetry, JasmineJasminePetryClaes, MartineMartineClaesWitters, ThomasThomasWittersZhao, ChaoChaoZhaoBrijs, BertBertBrijsRichard, OlivierOlivierRichardBender, HugoHugoBenderVandervorst, WilfriedWilfriedVandervorstCarter, RichardRichardCarterKluth, JonJonKluthDaté, L.L.DatéPique, D.D.PiqueHeyns, MarcMarcHeyns2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/8272Growth and physical properties of MOCVD-deposited hafnium oxide films and their properties on siliconProceedings paper