Comparison of electric properties of ultra-thin thermal and plasma nitrided silicon oxides with different post-deposition treatments using C-AFM

Polspoel, WouterWouterPolspoelVandervorst, WilfriedWilfriedVandervorstPetry, JasmineJasminePetryConard, ThierryThierryConardBenedetti, AlessandroAlessandroBenedetti2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11037Comparison of electric properties of ultra-thin thermal and plasma nitrided silicon oxides with different post-deposition treatments using C-AFMJournal article