Extreme UV Self-Aligned Double Patterning process optimization for BEOL interconnections on 3nm nodes and beyond

Montero Alvarez, DanielDanielMontero AlvarezBuccheri, NunzioNunzioBuccheriLin, QuyangQuyangLinRoy, SyamashreeSyamashreeRoyPaolillo, SaraSaraPaolilloWu, ChenChenWuHermans, YannickYannickHermansDecoster, StefanStefanDecosterBaudemprez, BartBartBaudemprezFinoulst, Jan-FrederikJan-FrederikFinoulstLazzarino, FredericFredericLazzarinoPark, SeonghoSeonghoParkTokei, ZsoltZsoltTokei2025-03-312024-06-062025-03-312024978-1-5106-7222-20277-786XWOS:001223585400011https://imec-publications.be/handle/20.500.12860/43995Extreme UV Self-Aligned Double Patterning process optimization for BEOL interconnections on 3nm nodes and beyondProceedings paper10.1117/12.3010454978-1-5106-7223-9WOS:001223585400011