Comparison between Vacuum Ultra-Violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching

Zotovich, AlexeyAlexeyZotovichEl Otell, ZiadZiadEl Otellde Marneffe, Jean-FrancoisJean-Francoisde MarneffeProshina, OlgaOlgaProshinaLopaev, DimitriDimitriLopaevRakhimova, TatyanaTatyanaRakhimovaBaklanov, MikhaïlMikhaïlBaklanov2021-10-232021-10-2320160963-0252https://imec-publications.be/handle/20.500.12860/27680Comparison between Vacuum Ultra-Violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etchingJournal articlehttp://iopscience.iop.org/article/10.1088/0963-0252/25/5/055001/meta