Study of ion and VUV effects on self-assembled organic low-k material exposed to argon plasma

de Marneffe, Jean-FrancoisJean-Francoisde MarneffeLjazouli, RamiRamiLjazouliSouriau, LaurentLaurentSouriauZhang, LipingLipingZhangLee, Hsiang-YunHsiang-YunLeeWilson, ChrisChrisWilsonBaklanov, MikhaïlMikhaïlBaklanov2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/20549Study of ion and VUV effects on self-assembled organic low-k material exposed to argon plasmaMeeting abstract