The limitation and optimization of bottom-up growth mode in through silicon via electroplating

Yang, LiuLiuYangRadisic, AlexAlexRadisicDeconinck, JohanJohanDeconinckVereecken, PhilippePhilippeVereecken2021-10-232021-10-2320150013-4651https://imec-publications.be/handle/20.500.12860/26213The limitation and optimization of bottom-up growth mode in through silicon via electroplatingJournal articlehttp://jes.ecsdl.org/content/162/14/D599.full?sid=37180e73-fa95-455b-ae81-4a17a996d13d