Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4 -precursor and H2 -plasma

Minjauw, MatthiasMatthiasMinjauwDendooven, JolienJolienDendoovenCapon, BorisBorisCaponSchaekers, MarcMarcSchaekersDetavernier, ChristopheChristopheDetavernier2021-10-222021-10-2220152050-7526https://imec-publications.be/handle/20.500.12860/25646Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4 -precursor and H2 -plasmaJournal articlehttp://pubs.rsc.org/en/Content/ArticleLanding/2015/TC/C5TC00751H#!divAbstract