Wafer-scale integration of double gated WS2-transistors in 300mm Si CMOS fab

Asselberghs, IngeIngeAsselberghsSmets, QuentinQuentinSmetsSchram, TomTomSchramGroven, BenjaminBenjaminGrovenVerreck, DevinDevinVerreckAfzalian, AryanAryanAfzalianArutchelvan, GouthamGouthamArutchelvanGaur, AbhinavAbhinavGaurCott, DaireDaireCottMaurice, ThibautThibautMauriceBrems, StevenStevenBremsKennes, KoenKoenKennesPhommahaxay, AlainAlainPhommahaxayDupuy, EmmanuelEmmanuelDupuyRadisic, DunjaDunjaRadisicde Marneffe, Jean-FrancoisJean-Francoisde MarneffeThiam, ArameArameThiamLi, WaikinWaikinLiDevriendt, KatiaKatiaDevriendtHuyghebaert, CedricCedricHuyghebaertLin, DennisDennisLinCaymax, MattyMattyCaymaxMorin, PierrePierreMorinRadu, IulianaIulianaRadu2021-12-082021-12-062021-12-0820202380-9248WOS:000717011600038https://imec-publications.be/handle/20.500.12860/38548Wafer-scale integration of double gated WS2-transistors in 300mm Si CMOS fabProceedings paper10.1109/IEDM13553.2020.9371926978-1-7281-8888-1WOS:000717011600038