Scatterometry and AFM measurement combination for area selective deposition process characterization

Saib, MohamedMohamedSaibMoussa, AlainAlainMoussaCharley, Anne-LaureAnne-LaureCharleyLeray, PhilippePhilippeLerayHung, JoeyJoeyHungKoret, RoyRoyKoretTurovets, IgorIgorTurovetsGer, AvronAvronGerDeng, ShaorenShaorenDengIlliberi, AndreaAndreaIlliberiMaes, Jan WillemJan WillemMaesWoodworth, GabrielGabrielWoodworthStrauss, MichaelMichaelStrauss2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/33926Scatterometry and AFM measurement combination for area selective deposition process characterizationProceedings paperhttps://doi.org/10.1117/12.2515177