Particle emission from chemically enhanced electron-beam-induced etching of Si: An approach for zero-energy secondary-ion mass spectrometry

Vanhove, NicoNicoVanhoveLievens, PeterPeterLievensVandervorst, WilfriedWilfriedVandervorst2021-10-182021-10-1820091098-0121https://imec-publications.be/handle/20.500.12860/16442Particle emission from chemically enhanced electron-beam-induced etching of Si: An approach for zero-energy secondary-ion mass spectrometryJournal article