The influence of wafer soaking and top coat processing on resist profile control in immersion lithography

Foubert, PhilippePhilippeFoubertVandenbroeck, NadiaNadiaVandenbroeckDelvaux, ChristieChristieDelvauxPollentier, IvanIvanPollentierErcken, MoniqueMoniqueErcken2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10458The influence of wafer soaking and top coat processing on resist profile control in immersion lithographyProceedings paper