Spacer defined double patterning for 20nm half pitch interconnect damascene structures

Siew, Yong KongYong KongSiewCockburn, AndrewAndrewCockburnBeyer, GeraldGeraldBeyerVersluijs, JankoJankoVersluijsKunnen, EddyEddyKunnenDekkers, HaroldHaroldDekkersVolders, HennyHennyVoldersCiofi, IvanIvanCiofiGravey, VirginieVirginieGraveyNoori, AtifAtifNooriPadhi, DeeneshDeeneshPadhiShah, KavitaKavitaShah2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17983Spacer defined double patterning for 20nm half pitch interconnect damascene structuresOral presentation