Kim, HoyounyHoyounyKimVaes, JanJanVaesLi, YunlongYunlongLiLeunissen, PeterPeterLeunissen2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13949The influence of barrier slurry selectivity on the design window for copper CMPProceedings paper