Wiaux, VincentVincentWiauxHendrickx, EricEricHendrickxBekaert, JoostJoostBekaertVandeweyer, TomTomVandeweyerVan Look, LieveLieveVan LookVerhaegen, StafStafVerhaegenVandenberghe, GeertGeertVandenberghe2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11556RET imaging capbility with 0.85NA ArF immersion lithographyProceedings paper