High NA EUV lithography simulation using new calibrated mask model

Wu, MeiyiMeiyiWuMakhotkin, IgorIgorMakhotkinPhilipsen, VickyVickyPhilipsenSoltwisch, VictorVictorSoltwischScholze, FrankFrankScholze2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/34458High NA EUV lithography simulation using new calibrated mask modelProceedings paper