Li, YunlongYunlongLiTarnowka, AlexandreAlexandreTarnowkaEliyahu, AvivAvivEliyahuHeylen, NancyNancyHeylenDelande, TinneTinneDelandeFavia, PaolaPaolaFaviaBender, HugoHugoBenderKellens, KristofKristofKellensLeunissen, PeterPeterLeunissen2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/15712Optical metrology based post Cu CMP metal residue detection and characterizationProceedings paper