Impact of process conditions on interface and high-k trap density studied by variable Tcharge-Tdischarge charge pumping (VT2CP)

Zahid, MohammedMohammedZahidDegraeve, RobinRobinDegraeveZhang, JohnJohnZhangGroeseneken, GuidoGuidoGroeseneken2021-10-162021-10-162007-09https://imec-publications.be/handle/20.500.12860/13256Impact of process conditions on interface and high-k trap density studied by variable Tcharge-Tdischarge charge pumping (VT2CP)Journal articlehttp://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6V0W-4NVM053-11&_user=799533&_rdoc=1&_fmt=&_orig=search&_sort=d&view=c