The kinetics of the early stages of electromigration and concurrent temperature induced processes in thin film metallisations studied by means of an in-situ high resolution resistometric technique

Van Olmen, JanJanVan OlmenManca, JeanJeanMancaDe Ceuninck, WardWardDe CeuninckDe Schepper, LucLucDe SchepperD'Haeger, V.V.D'HaegerWitvrouw, AnnAnnWitvrouwMaex, KarenKarenMaexVandevelde, BartBartVandeveldeBeyne, EricEricBeyneTielemans, LucLucTielemans2021-10-142021-10-141999https://imec-publications.be/handle/20.500.12860/3940The kinetics of the early stages of electromigration and concurrent temperature induced processes in thin film metallisations studied by means of an in-situ high resolution resistometric techniqueJournal article