Fuchimoto, DaisukeDaisukeFuchimotoSakai, H.H.SakaiShindo, H.H.ShindoIzawa, M.M.IzawaSugahara, H.H.SugaharaVan de Kerkhove, JeroenJeroenVan de KerkhoveDe Bisschop, PeterPeterDe Bisschop2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/22372Measurement technology to quantify 2D pattern shape in sub-2xnm advanced lithographyProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1677987