Double litho, double etch (LELE) process challenges for 22nm HP and beyond

Maenhoudt, MireilleMireilleMaenhoudtWiaux, VincentVincentWiauxCheng, ShauneeShauneeChengVandenberghe, GeertGeertVandenbergheRonse, KurtKurtRonse2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14088Double litho, double etch (LELE) process challenges for 22nm HP and beyondOral presentation