HfONx high-k layers deposited by MOCVD in mixed gas flows of N2O and O2

Zhao, ChaoChaoZhaoVan Elshocht, SvenSvenVan ElshochtConard, ThierryThierryConardXu, ZhenZhenXuCaymax, MattyMattyCaymaxDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeyns2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/8441HfONx high-k layers deposited by MOCVD in mixed gas flows of N2O and O2Meeting abstract