SOI thickness uniformity improvement using corrective etching for silicon nano-photonic device

Selvaraja, ShankarShankarSelvarajaRosseel, ErikErikRosseelFernandez, LuisLuisFernandezTabat, MartinMartinTabatBogaerts, WimWimBogaertsHautala, JohnJohnHautalaAbsil, PhilippePhilippeAbsil2021-10-192021-10-192011-09https://imec-publications.be/handle/20.500.12860/19761SOI thickness uniformity improvement using corrective etching for silicon nano-photonic deviceProceedings paper